Ion erosion and elemental purity of deposited Si films on Al
نویسندگان
چکیده
Sputter erosion depths in Si films deposited on Al substrates by PVD, CVD and plasma spay methods were measured after exposure to As+ ions a DC implanter beam Ga+ with scanned FIB. Erosion are optical methods. Metallic contamination the RBS. surface textures examined SEM.
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ژورنال
عنوان ژورنال: MRS Advances
سال: 2023
ISSN: ['2731-5894', '2059-8521']
DOI: https://doi.org/10.1557/s43580-022-00435-8